SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Spectral scatterometry for 2D trench metrology of low-K dual-damascene interconnect
Ukraintsev, Vladimir A., Kulkarni, Mak, Baum, Christopher C., Kirmse, Karen, Guevremont, Marco, Lakkapragada, Suresh, Bhatia, Kamal N., Herrera, Pedro P., Whitney, Umar K., Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473457
File:
PDF, 97 KB
english, 2002