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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Defect printability analysis study using virtual stepper system in a production environment
Chiou, Shao-Yung, Lei, Henrry, Liu, WeiJyh, Chu, M. J., Chiang, Daryl, Tuan, Steve, Hong, Chia-Lung, Chang, Michael, Chen, Jiunn-Hung, Chan, Kevin K., Qian, Qi-De, Cai, Lynn, Pang, Linyong, Herr, DaniVolume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473465
File:
PDF, 2.24 MB
english, 2002