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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
You, Tae-Jun, Kim, Hyeong-Soo, Kim, Jin-Soo, Kim, Seok-Kyun, Kim, Young-Deuk, Youn, Hyeong Sun, Kong, Keun-Kyu, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485331
File:
PDF, 549 KB
english, 2003