SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Impact of BARC on SEM shrinkage of ArF resist
Lee, Shi Yong, Sturtevant, John L., Kim, Myungsun, Yoon, Sangwoong, Kim, Kyung-Mee, Kim, Jae Hyun, Kim, Hyun-Woo, Woo, Sang-Gyun, Kim, Young Ho, Chon, Sang-Mun, Kishioka, Takahiro, Sone, Yasuhisa, NakVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.533884
File:
PDF, 921 KB
english, 2004