SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Mask enhancement factor for 2D local CD error
Arisawa, Yukiyasu, Komuro, Masanori, Mimotogi, ShojiVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617209
File:
PDF, 311 KB
english, 2005