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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Mask design rules (45nm): time for standardization
Mason, Mark, Weed, J. Tracy, Martin, Patrick M., Progler, Christopher J., Martin, Patrick, Ham, Young-Mog, Dillon, Brian, Pack, Robert, Heins, Mitch, Gookassian, John, Garcia, John, Boksha, VictorVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.633180
File:
PDF, 365 KB
english, 2005