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SPIE Proceedings [SPIE ICO20:Optical Design and Fabrication - Changchun, China (Sunday 21 August 2005)] ICO20: Optical Design and Fabrication - 3D photoresist etching simulation using cellular automata
Zhou, Zai-Fa, Huang, Qing-An, Li, Wei-Huan, Da, Fei-Peng, Shen, Hai-Pin, Breckinridge, James, Wang, YongtianVolume:
6034
Year:
2006
Language:
english
DOI:
10.1117/12.668110
File:
PDF, 317 KB
english, 2006