SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Overlay metrology for dark hard mask process: simulation and experiment study
Shin, Jangho, Archie, Chas N., Chalykh, Roman, Kang, Hyunjae, Kim, SeongSue, Lee, SukJoo, Cho, Han-KuVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.711389
File:
PDF, 652 KB
english, 2007