SPIE Proceedings [SPIE Optical Metrology - Munich, Germany (Monday 18 June 2007)] Modeling Aspects in Optical Metrology - In-line etching process control using dynamic scatterometry
Soulan, Sébastien, Besacier, Maxime, Leveder, Tanguy, Schiavone, Patrick, Bosse, Harald, Bodermann, Bernd, Silver, Richard M.Volume:
6617
Year:
2007
Language:
english
DOI:
10.1117/12.726197
File:
PDF, 1.52 MB
english, 2007