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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Effects of bake temperature and surface modifications on hardmask materials for trilayer applications
Henderson, Clifford L., Neef, Charles J., Finazzo, Jim, Nesbit, Cheryl, Weigand, MichaelVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.771701
File:
PDF, 1.03 MB
english, 2008