SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Resist freezing process for double exposure lithography
Henderson, Clifford L., Chen, Kuang-Jung Rex, Huang, Wu-Song, Li, Wai-Kin, Varanasi, P. RaoVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772852
File:
PDF, 487 KB
english, 2008