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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - The use of EUV lithography to produce demonstration devices
LaFontaine, Bruno, Schellenberg, Frank M., Deng, Yunfei, Kim, Ryoung-Han, Levinson, Harry J., McGowan, Sarah, Okoroanyanwu, Uzodinma, Seltmann, Rolf, Tabery, Cyrus, Tchikoulaeva, Anna, Wallow, Tom, WoVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772933
File:
PDF, 1.11 MB
english, 2008