SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Using scatterometry to improve process control during the spacer pitch splitting process
Corboy, Scott, Chen, Alek C., Lin, Burn, MacNaughton, Craig, Gubiotti, Thomas, Yen, Anthony, Wollenweber, MarcusVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804578
File:
PDF, 223 KB
english, 2008