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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Study of the pattern categorization method in verification of OPC pattern
Naoe, Mitsufumi, Hosono, Kunihiro, Miyauchi, Toru, Makino, Seiji, Suzuki, Koichi, Oseki, Masakazu, Okada, TomoyukiVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824353
File:
PDF, 235 KB
english, 2009