SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - OPC model space approach to in-line process monitoring structures
Sabatier, Romuald, Zurbrick, Larry S., Montgomery, M. Warren, Di Giacomo, Antonio, Fossati, Caroline, Bourennane, SalahVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.829745
File:
PDF, 836 KB
english, 2009