SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Study of OPC accuracy by illumination source types
Yang, Kiho, Chen, Alek C., Han, Woo-Sung, Park, Daejin, Lee, Jeonkyu, Lin, Burn J., Yen, Anthony, Oh, Sangjin, Jeon, Jinhyuck, You, Taejun, Park, Chanha, Yim, Donggyu, Park, SungkiVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837224
File:
PDF, 389 KB
english, 2009