SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Continuous evolution of lithographic films through process steps: an example with 193 chemically amplified resists
Derrough, Samir, Allen, Robert D., Tiron, Raluca, Perret, Damien, Thackeray, James W., Sourd, Claire, Paniez, PatrickVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846087
File:
PDF, 720 KB
english, 2010