![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, United States (Sunday 1 August 2010)] Advances in Metrology for X-Ray and EUV Optics III - ESRF metrology laboratory: overview of instrumentation, measurement techniques, and data analysis
Rommeveaux, Amparo Vivo, Assoufid, Lahsen, Takacs, Peter Z., Lantelme, Benjamin, Barrett, Raymond, Asundi, Anand K.Volume:
7801
Year:
2010
Language:
english
DOI:
10.1117/12.864141
File:
PDF, 1.39 MB
english, 2010