SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Development of practical flare correction tool for full chip in EUV lithography
Uno, Taiga, Mashita, Hiromitsu, Miyairi, Masahiro, Kotani, Toshiya, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916129
File:
PDF, 528 KB
english, 2012