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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - The novel spin-on hard mask and ultrathin UL material for EUVL
Sakamoto, Rikimaru, Yaguchi, Hiroaki, Shigaki, Syuhei, Sassa, Suguru, Fujitani, Noriaki, Endo, Takafumi, Onishi, Ryuji, Ho, Bang Ching, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916328
File:
PDF, 1.27 MB
english, 2012