SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Phase defect printability analyses: dependence of defect type and EUV exposure condition
Terasawa, Tsuneo, Yamane, Takeshi, Arisawa, Yukiyasu, Watanabe, Hidehiro, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916387
File:
PDF, 905 KB
english, 2012