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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Murugesan Kuppuswamy, Vijaya-Kumar, Constantoudis, Vassilios, Gogolides, Evangelos, Vaglio Pret, Alessandro, Gronheid, Roel, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.918033
File:
PDF, 5.16 MB
english, 2012