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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Study on the over-top-coating suppressing surface insoluble layer generation for chemical amplification resist
Kumada, Teruhiko, Tanaka, Youko, Ueyama, Akemi, Kubota, Shigeru, Koezuka, Hiroshi, Hanawa, Tetsuro, Morimoto, Hiroaki, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154764
File:
PDF, 677 KB
english, 1993