![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - PRIME process: an alternative to multiple layer resist systems and high accelerating voltage for e-beam lithography
Tedesco, Serge V., Pierrat, Christophe, Vinet, Francoise, Florin, Brigitte, Lerme, Michel, Guibert, Jean C., Resnick, Douglas J.Volume:
1263
Year:
1990
Language:
english
DOI:
10.1117/12.20168
File:
PDF, 841 KB
english, 1990