SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Yield-aware decomposition for LELE double patterning

Sturtevant, John L., Capodieci, Luigi, Kohira, Yukihide, Yokoyama, Yoko, Kodama, Chikaaki, Takahashi, Atsushi, Nojima, Shigeki, Tanaka, Satoshi
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Volume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2046180
File:
PDF, 214 KB
english, 2014
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