![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Yield-aware decomposition for LELE double patterning
Sturtevant, John L., Capodieci, Luigi, Kohira, Yukihide, Yokoyama, Yoko, Kodama, Chikaaki, Takahashi, Atsushi, Nojima, Shigeki, Tanaka, SatoshiVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2046180
File:
PDF, 214 KB
english, 2014