SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Study of SiC x-ray mask distortion induced by backetching receding subtractive fabrication process
Tsuboi, Shinji, Shoki, Tsutomu, Ohta, Tsuneaki, Okuyama, Hiroshi, Ashikaga, Kinya, Yamashita, Yoshio, Ohkubo, Ryo, Yamaguchi, Yoichi, Hoga, Hiroshi, Yoshihara, HideoVolume:
2512
Year:
1995
Language:
english
DOI:
10.1117/12.212773
File:
PDF, 300 KB
english, 1995