SPIE Proceedings [SPIE Microelectronic Manufacturing '95 - Austin, TX (Wednesday 25 October 1995)] Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II - Evaluation of near-surface microdefects in Czochralski-Si wafers after a CMOS process by an infrared interference method
Kitagawara, Yutaka, Aihara, Ken-ichi, Oka, Satoshi, Takenaka, Takao, Lowell, John K., Chen, Ray T., Mathur, Jagdish P.Volume:
2638
Year:
1995
Language:
english
DOI:
10.1117/12.221204
File:
PDF, 385 KB
english, 1995