SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Analyzing block placement errors in SADP patterning
Hohle, Christoph K., Younkin, Todd R., Kobayashi, Shinji, Okada, Soichiro, Shimura, Satoru, Nafus, Kathleen, Fonseca, Carlos, Demand, Marc, Biesemans, Serge, Versluijs, Janko, Ercken, Monique, FoubertVolume:
9779
Year:
2016
Language:
english
DOI:
10.1117/12.2218597
File:
PDF, 1.56 MB
english, 2016