SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Novel metal containing resists for EUV lithography extendibility
Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Sayan, Safak, Dei, Satoshi, Pollentier, Ivan, Kuwahara, Yuhei, Vandenberghe, Geert, Nafus, Kathleen, Shiratani, Motohiro, Nakagawa, Hisashi,Volume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2220149
File:
PDF, 1.28 MB
english, 2016