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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Sub-0.35-um critical dimension metrology using atomic force microscopy
Guarini, Kathryn, Singh, Bhanwar, Arnold, William H., Jones, Susan K.Volume:
2725
Year:
1996
Language:
english
DOI:
10.1117/12.240111
File:
PDF, 1.03 MB
english, 1996