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SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Masks for extreme ultraviolet lithography
Vernon, Stephen P., Kearney, Patrick A., Tong, William M., Prisbrey, Shon T., Larson, Cindy C., Moore, Craig E., Weber, Frank J., Cardinale, Gregory F., Yan, Pei-yang, Hector, Scott D., Grenon, BrianVolume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332826
File:
PDF, 933 KB
english, 1998