SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara,...

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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography

Wu, Frank F., Tang, Wen-Chieh, Wirpszo, Kazimierz W., Guo, Xiaoming, Xu, Meisheng, Semyonov, Oleg G., Huang, C., Klibanov, Lev, Panarella, Emilio, Dobisz, Elizabeth A.
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Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390113
File:
PDF, 967 KB
english, 2000
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