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SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Polygate within wafer CD uniformity improvement by the minimization of lens heating effect
Chang, Yuh-Sen, Wu, M. J., Hung, Ming-Yeon, Cheng, K. Y., Hsieh, J. C., Mack, Chris A., Stevenson, TomVolume:
4404
Year:
2001
Language:
english
DOI:
10.1117/12.425219
File:
PDF, 141 KB
english, 2001