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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Vacuum delay effect of CAR in mask fabrication
Kim, Chang-Hwan, Jeon, Chan-Uk, Han, Sung-Jae, Cho, Won-Il, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436658
File:
PDF, 770 KB
english, 2001