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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Defect printability study with programmed defects on halftone reticles
Dettmann, Wolfgang, Haffner, Henning, Heumann, Jan P., Liebe, Roman, Ludwig, R., Moses, R., Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438398
File:
PDF, 794 KB
english, 2001