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SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II - Measurement of total integrated scatter of optical coatings for 157-nm lithography
Saito, Tadahiko, Saito, Jun, Nakamura, Etsuro, Kudo, Tatsunobu, Kagaya, Masanao, Takahashi, Tetsuo, Duparre, Angela, Singh, BhanwarVolume:
4449
Year:
2001
Language:
english
DOI:
10.1117/12.450106
File:
PDF, 515 KB
english, 2001