SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Applicability of dry developable deep-UV lithography to sub-0.5 um processing
Goethals, Anne-Marie, Baik, Ki-Ho, Van den Hove, Luc, Tedesco, Serge V., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46408
File:
PDF, 1.83 MB
english, 1991