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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - High numerical aperture: imaging implications for chemically amplified photoresists
Sanchez, Martha I., Houle, Frances A., Hoffnagle, John A., Brunner, Timothy A., Hinsberg, William D., Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474233
File:
PDF, 1.11 MB
english, 2002