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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - First review of a suitable metrology framework for the 65-nm technology node
Severgnini, Ermes, Vasconi, Mauro, Herisson, David, Thony, Philippe, Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.482645
File:
PDF, 1.47 MB
english, 2003