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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Optimization of the contact layer for 90-nm node lithography
Strozewski, Kirk J., Zavyalova, Lena, Lucas, Kevin, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485419
File:
PDF, 233 KB
english, 2003