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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield
Takikawa, Tadahiko, Mackay, R. Scott, Ishikawa, Mikio, Yusa, Satoshi, Kinase, Yoshinori, Fujita, Hiroshi, Hoga, Morihisa, Hayashi, Naoya, Sano, HisatakeVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.535108
File:
PDF, 956 KB
english, 2004