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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Surface conditioning solutions to reduce resist line roughness
Zhang, Peng, Sturtevant, John L., Jaramillo, Jr., Manuel, Rao, Madhukar B., Yates, Colin, King, Danielle M., Ross, Brenda F., O'Brien, Bridget L.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535819
File:
PDF, 730 KB
english, 2004