SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Analysis of mask CD error by dose modulation for fogging effect
Lee, Hojune, Tanabe, Hiroyoshi, Yang, Seung-Hune, Kim, Byung-Gook, Moon, Sung-Yong, Choi, Sung-Woon, Yoon, Hee-Sun, Han, Woo-SungVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557713
File:
PDF, 168 KB
english, 2004