SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Optical mask inspection strategy for 65-nm node and beyond
Chung, Dong-Hoon P., Tanabe, Hiroyoshi, Ohira, Katsumi, Yoshioka, Nobuyuki, Matsumura, Kenichi, Tojo, Toru, Otaki, MasaoVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557726
File:
PDF, 680 KB
english, 2004