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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Ru-capped EUVL ML mask blank performance
Yan, Pei-Yang, Tanabe, Hiroyoshi, Zhang, Guojing, Spiller, Eberhard, Mirkarimi, Paul B.Volume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557816
File:
PDF, 509 KB
english, 2004