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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Full-chip-model-based correction of flare-induced linewidth variation
Word V, James, Belledent, Jerome, Trouiller, Yorick, Maurer, Wilhelm, Granik, Yuri, Sahouria, Emile, Toublan, Olivier, Staud, Wolfgang, Weed, J. TracyVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569175
File:
PDF, 631 KB
english, 2004