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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Software to simulate dry etch in photomask fabrication
Babin, Sergey, Bay, Konstantin, Okulovsky, Sergey, Staud, Wolfgang, Weed, J. TracyVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.575426
File:
PDF, 178 KB
english, 2004