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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Metal etcher qualification using angular scatterometry
Jekauc, Igor, Silver, Richard M., Moffitt, Jasen, Shakya, Sushil, Donohue, Elizabeth, Dasari, Prasad, Raymond, Christopher J., Littau, MikeVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.598828
File:
PDF, 459 KB
english, 2005