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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Adhesion between template materials and UV-cured nanoimprint resists
Houle, Frances A., Lin, Qinghuang, Guyer, Eric, Miller, Dolores C., Dauskardt, Reinhold, Rice, Emily, Hamilton, JeremyVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655698
File:
PDF, 382 KB
english, 2006