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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Demolding strategy to improve the hot embossing throughput
Leveder, Tanguy, Lercel, Michael J., Landis, Stefan, Davoust, Laurent, Soulan, Sebastien, Chaix, NicolasVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711151
File:
PDF, 860 KB
english, 2007